Atomic Layer Deposition of copper - If you like sputtering, you'll love this!
Published : 31-07-2021 - Duration : 00:27:01 - Like : 18,191 - Dislike : 0
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Description :
An explanation and demo of atomic layer deposition (ALD) of copper metal on glass. Precursors are copper(I) chloride and hydrogen, processed in a hot-wall tube quartz tube furnace. 10 torr operating pressure 500 sccm argon sweep/purge gas constantly flowing 75 sccm CuCl argon pulse gas (17 seconds including flow controller lag) 100 sccm H pulse gas (14 seconds including flow controller lag) 7 second purge time between pulses 100mm quartz tube furnace diameter 415*C deposition temperature 350*
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